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专利名称：Method of separating a template from a
substrate during imprint lithography
发明人：Byung Jin Choi,Sidlgata V.
Sreenivasan,Stephen C. Johnson
申请号：US10617321申请日：20030710公开号：US06870301B2公开日：20050322
专利附图：
摘要：Processes and associated devices for high precision positioning of a template ansubstrate during imprint lithography includes a calibration system with a course
calibration stage and a fine orientation stage capable of maintaining a uniform gapbetween the template and substrate. The fine orientation stage includes a pair of flexuremembers having flexure joints for motion about a pivot point intersected by first andsecond orientation axes. Actuators lengthen or shorten to expand or contract the flexuremembers. Separation of the template is achieved using a peel-and-pull method thatavoids destruction of imprinted features from the substrate.
申请人：Byung Jin Choi,Sidlgata V. Sreenivasan,Stephen C. Johnson
地址：Round Rock TX US,Austin TX US,Austin TX US
国籍：US,US,US
代理人：Kenneth C. Brooks
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