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专利名称：BARRIER FILM, ORGANIC EL DEVICE,
FLEXIBLE SUBSTRATE, AND METHOD FORMANUFACTURING BARRIER FILM
发明人：Yuka ISAJI申请号：US14768858申请日：20140523
公开号：US20160013445A1公开日：20160114
专利附图：
摘要：A barrier film that contains primarily silicon nitride has a total hydrogenconcentration of 3×10atoms/cmor higher and a silicon-bonded hydrogen concentration
proportion of 40% or higher, the total hydrogen concentration indicating a total of aconcentration of hydrogen bonded to silicon and a concentration of hydrogen bonded tonitrogen, and the silicon-bonded hydrogen concentration proportion indicating aproportion of the concentration of hydrogen bonded to silicon to the total hydrogenconcentration.
申请人：PANASONIC CORPORATION
地址：Kadoma-shi, Osaka JP
国籍：JP
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