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专利名称：Exposure apparatus and exposure method发明人：Minoru Takeda,Motohiro Furuki,Shingo
Imanishi
申请号：US09619996申请日：20000720公开号：US06704096B1公开日：20040309
专利附图：
摘要：In an exposure apparatus and an exposure method, a disc master to be used inthe preparation of an optical disc is applied to an exposure device, making it possible toperform exposure on a disc master for an optical disc which is substantially improved in
recording density. An exposure laser beam by SHG having a wavelength of 300 nm or lessis modulated by a modulator, and applied by near field effect to a disc master by usingan objective lens having a numerical aperture of 1.0 or more.
申请人：SONY CORPORATION
代理机构：Oblon, Spivak, McClelland, Maier & Neustadt, P.C.
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