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专利名称：METHOD AND SYSTEM FOR MODEL-BASED
DESIGN AND LAYOUT OF AN INTEGRATEDCIRCUIT
发明人：Ya-Chieh Lai,Frank Gennari,Matthew
Moskewicz,Srinivas Doddi,JunjiangLei,Weiping Fang,Kuanghao Lay
申请号：US13535242申请日：20120627
公开号：US20120272201A1公开日：20121025
专利附图：
摘要：A approach is described for allowing electronic design, verification, andoptimization tools to implement very efficient approaches to allow the tools to directlyaddress the effects of manufacturing processes, e.g., to identify and prevent problemscaused by lithography processing. Fast models and pattern checking are employed tointegrate lithography and manufacturing aware processes within EDA tools such asrouters.
申请人：Ya-Chieh Lai,Frank Gennari,Matthew Moskewicz,Srinivas Doddi,JunjiangLei,Weiping Fang,Kuanghao Lay
地址：Sunnyvale CA US,San Jose CA US,San Mateo CA US,Fremont CA US,Bellevue WAUS,Fremont CA US,Mountain View CA US
国籍：US,US,US,US,US,US,US
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